Tokyo, Japan

Akira Oohisa

This inventor holds 1 USPTO granted patent. Top assignee: Mitsubishi Denki Kabushiki Kaisha. Active years: 1998.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Akira Oohisa. Retrieved from https://idiyas.com/inventor/akira-oohisa

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 4.0

ph-index = 1

Forward Citations = 25(Granted Patents)


Company Filing History:


Years Active: 1998

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1 patent (USPTO):Explore Patents

Title: Akira Oohisa: Innovator in Semiconductor Manufacturing

Introduction

Akira Oohisa is a prominent inventor based in Tokyo, Japan. He has made significant contributions to the field of semiconductor manufacturing. His innovative work has led to the development of a unique apparatus that enhances the efficiency and accuracy of semiconductor processes.

Latest Patents

Oohisa holds 1 patent for a semiconductor manufacturing apparatus. This invention features a particle monitor that counts fine particles in the exhaust gas of a process chamber. The end point detection controller observes the count value over time to determine the end point of plasma etching or cleaning. This technology allows for high-accuracy calibration of the particle monitor, improving the overall reliability of semiconductor manufacturing.

Career Highlights

Oohisa is associated with Mitsubishi Electric Corporation, where he has been instrumental in advancing semiconductor technologies. His work has not only contributed to the company's reputation but has also played a vital role in the semiconductor industry.

Collaborations

Oohisa has collaborated with notable colleagues, including Hisashi Tsukazaki and Makoto Doi. Their combined expertise has fostered innovation and development in semiconductor manufacturing processes.

Conclusion

Akira Oohisa's contributions to semiconductor manufacturing exemplify the impact of innovative thinking in technology. His patent and collaborative efforts continue to influence the industry positively.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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