Shigehito Ibuka

Title: Shigehito Ibuka: Innovator in Semiconductor Technology

Introduction

Shigehito Ibuka is a prominent inventor based in Kofu, Japan. He has made significant contributions to the field of semiconductor technology, holding a total of 4 patents. His innovative approaches have advanced the manufacturing processes in the semiconductor industry.

Latest Patents

One of his latest patents is a method of cleaning a process tube. This method involves carrying silicon wafers out of the process tube, lowering the temperature within the tube to room temperature or higher, and supplying a cleaning gas containing ClF.sub.3. This gas reacts with poly-silicon and amorphous silicon stuck to the inner wall of the process tube, allowing for efficient removal of contaminants. Another notable patent is for the manufacture of boron-containing films by CVD or epitaxial techniques. This invention focuses on forming high-quality boron-containing films on semiconductor wafers using reaction gases that include boron trifluoride.

Career Highlights

Shigehito Ibuka has worked with notable companies such as Tokyo Electron Limited and Iwatani International Corporation. His experience in these organizations has allowed him to refine his skills and contribute to groundbreaking advancements in semiconductor technology.

Collaborations

Throughout his career, Ibuka has collaborated with talented individuals, including Tsuyoshi Wakabayashi and Chitoshi Nogami. These partnerships have fostered innovation and have been instrumental in the development of his patented technologies.

Conclusion

Shigehito Ibuka's contributions to semiconductor technology through his patents and collaborations highlight his role as a key innovator in the field. His work continues to influence the industry and pave the way for future advancements.