Ichihara, Japan

Shigeharu Fujii

This inventor holds 3 USPTO granted patents, plus 1 CIPO patent. Top assignee: Mitsui Chemicals, Inc.. Active years: 2008-2013.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Shigeharu Fujii. Retrieved from https://idiyas.com/inventor/shigeharu-fujii

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile



Average Co-Inventor Count = 5.9

ph-index = 2

Forward Citations = 8(Granted Patents)


Location History:

  • Sodegaura, JP (2008)
  • Nishiwaki, JP (2012)
  • Ichihara, JP (2013)

Company Filing History:


Years Active: 2008-2013

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3 patents (USPTO):Explore Patents

Title: The Innovations of Shigeharu Fujii

Introduction

Shigeharu Fujii is a notable inventor based in Ichihara, Japan. He has made significant contributions to the field of polishing materials and compositions, holding a total of three patents. His work focuses on enhancing the efficiency and effectiveness of polishing processes.

Latest Patents

Fujii's latest patents include a polishing slurry designed to minimize damage to underlying layers while maintaining an adequate polishing rate. This innovative slurry contains a resin with an amide group and an organic resin. Another notable patent is a polishing composition that includes at least 1 wt % of a water-soluble resin, which is derived from polymerizing a vinyl monomer containing an amino group and/or an amide group.

Career Highlights

Shigeharu Fujii is currently employed at Mitsui Chemicals, Inc., where he continues to develop advanced materials for various applications. His expertise in polishing technology has positioned him as a key figure in his field.

Collaborations

Fujii has collaborated with several talented individuals, including Akinori Etoh and Setsuko Oike. These partnerships have contributed to the advancement of his research and innovations.

Conclusion

Shigeharu Fujii's work in polishing materials showcases his commitment to innovation and excellence. His patents reflect a deep understanding of material science and its applications in industry.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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