This inventor holds 1 USPTO granted patent and 1 published patent application. Top assignee: Daikin Industries, Ltd.. Active years: 2026.
Company Filing History:
Years Active: 2026
Title: Shichou Chin: Innovator in Film Forming Technology
Introduction
Shichou Chin is a notable inventor based in Osaka, Japan. He has made significant contributions to the field of coating technologies, particularly through his innovative patent related to film forming methods.
Latest Patents
Chin holds a patent for a film forming method, polyphenylene sulfide powder coating material, coating film, and coated article. This patent describes a method that enables the formation of a film with a thickness of 500 μm or more using a single coating on a substrate. The process involves heating a powder coating material containing polyphenylene sulfide resin at temperatures ranging from 250 to 400° C. The resulting film exhibits a surface roughness, Ra, of 0.30 μm or less, showcasing the precision and effectiveness of his method.
Career Highlights
Shichou Chin is currently employed at Daikin Industries, Ltd., where he continues to develop and refine innovative technologies. His work has positioned him as a key figure in the advancement of coating materials and methods.
Collaborations
Chin collaborates with esteemed colleagues such as Hirotake Imada and Toshio Miyatani, contributing to a dynamic environment of innovation and research.
Conclusion
Shichou Chin's contributions to film forming technology highlight his expertise and commitment to advancing the field. His innovative methods and collaborative efforts continue to influence the industry positively.