Company Filing History:
Years Active: 2018
Title: Shiang-Chin Lu: Innovator in Semiconductor Technology
Introduction
Shiang-Chin Lu is a prominent inventor based in Hsinchu, Taiwan. He has made significant contributions to the field of semiconductor technology, particularly through his innovative patent.
Latest Patents
Shiang-Chin Lu holds a patent for a semiconductor structure and method for manufacturing the same. This semiconductor structure includes a semiconductor substrate, a dielectric layer, a buffer layer, at least one recess, and at least one conductor. The dielectric layer is positioned on the semiconductor substrate, while the buffer layer is situated between the semiconductor substrate and the dielectric layer. The recess extends into the semiconductor substrate through both the dielectric layer and the buffer layer. Notably, the buffer layer has a removing rate with respect to an etching process for forming the recess, which is between those of the semiconductor substrate and the dielectric layer. The conductor is present in the recess. This innovative design enhances the efficiency and functionality of semiconductor devices.
Career Highlights
Shiang-Chin Lu is currently employed at Taiwan Semiconductor Manufacturing Company Ltd., a leading firm in the semiconductor industry. His work has contributed to advancements in semiconductor manufacturing processes and technologies.
Collaborations
Shiang-Chin Lu has collaborated with notable colleagues, including Chien-Chih Wu and Jer-Shien Yang. Their combined expertise has fostered innovation and development in semiconductor technologies.
Conclusion
Shiang-Chin Lu's contributions to semiconductor technology through his patent and work at Taiwan Semiconductor Manufacturing Company Ltd. highlight his role as an influential inventor in the field. His innovative approaches continue to shape the future of semiconductor manufacturing.