Changhua, Taiwan

Shi-Rong Chen

This inventor holds 1 USPTO granted patent. Top assignee: Taiwan Semiconductor Manufacturing Comp. Ltd.. Active years: 2005.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Shi-Rong Chen. Retrieved from https://idiyas.com/inventor/shi-rong-chen

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


Average Co-Inventor Count = 3.0

ph-index = 1

Forward Citations = 2(Granted Patents)


Company Filing History:


Years Active: 2005

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1 patent (USPTO):Explore Patents

Title: Innovations of Shi-Rong Chen in Semiconductor Processing

Introduction

Shi-Rong Chen is a notable inventor based in Changhua, Taiwan. He has made significant contributions to the field of semiconductor processing, particularly through his innovative patent that enhances the efficiency of plasma processes.

Latest Patents

Shi-Rong Chen holds a patent titled "Method for recovering a plasma process." This invention involves an automated system for monitoring and controlling semiconductor wafer plasma processes. The method includes performing a plasma process according to a specific recipe, collecting essential parameters such as RF power and process time at predetermined intervals, and storing these parameters in a selectively queryable database. This allows for the retrieval of plasma process history, which can be used to determine a second recipe if the process is aborted.

Career Highlights

Shi-Rong Chen is currently employed at Taiwan Semiconductor Manufacturing Company Limited, a leading firm in the semiconductor industry. His work focuses on improving plasma processing techniques, which are crucial for the fabrication of semiconductor devices.

Collaborations

Shi-Rong Chen collaborates with talented colleagues, including Yu-Wen Fang and Ching-Shan Lu, who contribute to the innovative environment at their workplace.

Conclusion

Shi-Rong Chen's contributions to semiconductor processing through his patent demonstrate his commitment to advancing technology in this critical field. His work not only enhances efficiency but also sets a foundation for future innovations in semiconductor manufacturing.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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