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Years Active: 2018-2019
Title: The Innovative Mind of Shi-Lu Zhan: Pioneering Advances in Sputtering Targets
Introduction: Shi-Lu Zhan, an accomplished inventor based in Beijing, China, has made significant strides in the field of materials science through his innovative work on sputtering targets. With two patents to his name, Zhan is recognized for his contributions that enhance the efficiency and functionality of electronic components.
Latest Patents: Shi-Lu Zhan's latest patents focus on advancements in sputtering targets, specifically featuring indium cerium zinc oxide (InCeZnO). His first patent details a sputtering target with a relative density of 90% or greater and a bulk resistance ranging from about 10 Ω cm to about 10 Ω cm. Notably, the crystalline InCeZnO content in the target exceeds 80%. The second patent elaborates on a method for manufacturing this sputtering target, emphasizing the combination of indium oxide, cerium oxide, and zinc oxide powders. This method involves mixing the components in a precise molar ratio and sintering the mixture between 1250°C and 1650°C.
Career Highlights: Shi-Lu Zhan has contributed his expertise to prominent institutions, including Tsinghua University and Hon Hai Precision Industry Co., Ltd. His work at these organizations reflects his commitment to advancing technology and fostering innovation in materials used for modern electronics.
Collaborations: Throughout his career, Zhan has collaborated with notable colleagues including Da-Ming Zhuang and Ming Zhao. Their collective efforts have played a vital role in driving forward the research and development of cutting-edge materials.
Conclusion: Shi-Lu Zhan stands out as a notable inventor in the realm of sputtering targets, particularly with his focus on indium cerium zinc oxide. His innovative patents and collaborations continue to influence the industry, paving the way for future advancements in electronic materials.