This inventor holds 1 USPTO granted patent. Top assignee: Taiwan Semiconductor Manufacturing Comp. Ltd.. Active years: 2019.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2019
Title: **Shi-Jieh Lin: Innovator in Semiconductor Technology**
Introduction
Shi-Jieh Lin, a notable inventor based in Hsinchu, Taiwan, has made significant contributions to the field of semiconductor technology. With a focus on developing innovative manufacturing methods for semiconductor substrates, Lin holds one patent that reflects his expertise in this rapidly evolving industry.
Latest Patents
Lin's most recent patent is titled "Semiconductor substrate and manufacturing method of the same." This patent discloses a method for manufacturing a semiconductor wafer featuring an epitaxial layer on its front surface. The process involves providing the semiconductor wafer with a specific dopant concentration and forming a polysilicon layer over the front surface. Subsequent steps include the removal of the polysilicon layer and the deposition of an epitaxial layer under controlled temperature conditions. An essential part of this innovation is the control of the transition width of the dopant across the semiconductor wafer and the epitaxial layer, which is maintained at approximately 0.75 micrometers.
Career Highlights
Shi-Jieh Lin is currently associated with Taiwan Semiconductor Manufacturing Company Ltd., a leader in the semiconductor industry. His role involves leveraging his knowledge and skills to enhance semiconductor manufacturing processes further. Through his innovative work, Lin contributes to the advancement of technology that supports various electronics and computing applications.
Collaborations
Throughout his career, Lin has collaborated with talented professionals, including coworkers Pu-Fang Chen and Wei-Zhe Chang. These collaborations have fostered a creative environment conducive to technological advancements, enabling Lin and his team to develop cutting-edge solutions in semiconductor manufacturing.
Conclusion
Shi-Jieh Lin stands out as a prominent figure in the semiconductor technology field. With his patent on semiconductor substrate manufacturing, Lin continues to drive innovation and pave the way for future developments in electronics. His work exemplifies the impact of inventive minds in shaping the technological landscape.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile