Shenlong Xuan

Title: Innovations of Shenlong Xuan in Semiconductor Technology

Introduction

Shenlong Xuan is a notable inventor based in Shanghai, China. He has made significant contributions to the field of semiconductor technology, particularly in the monitoring of gate oxide thickness. His innovative approach has the potential to enhance the accuracy of semiconductor manufacturing processes.

Latest Patents

Shenlong Xuan holds a patent for a method that effectively monitors gate oxide thickness. The patent describes a device structure that includes a gate structure, a gate oxide layer, source and drain regions, and a base region. The method involves applying a voltage to the gate structure to form an accumulation layer, followed by the application of a small AC voltage. This technique allows for the accurate measurement of the gate oxide layer's thickness, thereby avoiding errors associated with existing methods.

Career Highlights

Shenlong Xuan is currently employed at Shanghai Huali Integrated Circuit Corporation. His work at this company has positioned him as a key player in the semiconductor industry. His innovative methods are expected to contribute significantly to advancements in integrated circuit technology.

Collaborations

Shenlong has collaborated with notable colleagues, including Haibo Lei and Xingmei Yang. Their combined expertise in semiconductor technology fosters an environment of innovation and progress within their field.

Conclusion

Shenlong Xuan's contributions to semiconductor technology, particularly through his patented method for monitoring gate oxide thickness, highlight his role as an influential inventor. His work continues to pave the way for advancements in the industry.