Beijing, China

Shenghua Bao

USPTO Granted Patents = 16 

Average Co-Inventor Count = 5.3

ph-index = 5

Forward Citations = 97(Granted Patents)


Location History:

  • Beijing, CN (2013 - 2018)
  • San Jose, CA (US) (2018 - 2021)

Company Filing History:


Years Active: 2013-2021

where 'Filed Patents' based on already Granted Patents

16 patents (USPTO):

Title: Innovations of Shenghua Bao

Introduction

Shenghua Bao is a prominent inventor based in Beijing, China. He holds a total of 16 patents, showcasing his significant contributions to the field of technology and innovation. His work primarily focuses on generating hierarchical patterns based on textual analysis, which has applications in various domains.

Latest Patents

One of Shenghua Bao's latest patents is titled "Hierarchical target centric pattern generation." This invention relates to generating hierarchical patterns based on a corpus of text. The process involves analyzing the corpus, which includes extracting a set of features. A set of grammatical patterns is generated based on these extracted features. The generated patterns include at least one grammatical pattern derived from an internal pattern and at least one from an external pattern. These grammatical patterns are then organized into a hierarchy and/or ranked, with the hierarchy and ranking visually displayed.

Career Highlights

Throughout his career, Shenghua Bao has worked with notable companies, including International Business Machines Corporation (IBM) and Nuance Communications, Inc. His experience in these organizations has contributed to his expertise in the field of pattern generation and analysis.

Collaborations

Shenghua Bao has collaborated with several professionals in his field, including Zhong Su and Jian Ye Chen. These collaborations have likely enriched his work and led to further innovations.

Conclusion

Shenghua Bao's contributions to technology through his patents and collaborations highlight his role as a significant inventor in the industry. His innovative approaches to pattern generation continue to influence advancements in various applications.

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