The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 26, 2021

Filed:

Oct. 05, 2015
Applicant:

International Business Machines Corporation, Armonk, NY (US);

Inventors:

Shenghua Bao, San Jose, CA (US);

Ying Chen, San Jose, CA (US);

Anshu N. Jain, Sunnyvale, CA (US);

Cartic Ramakrishnan, San Jose, CA (US);

Maia A. Smith, Burnaby, CA;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G06F 16/33 (2019.01); G06F 16/338 (2019.01); G06F 40/284 (2020.01); G06F 40/289 (2020.01); G06F 40/295 (2020.01);
U.S. Cl.
CPC ...
G06F 16/3344 (2019.01); G06F 16/338 (2019.01); G06F 40/284 (2020.01); G06F 40/289 (2020.01); G06F 40/295 (2020.01);
Abstract

The embodiments relate to generating hierarchical patterns based on a corpus of text. The corpus is analyzed, which includes extracting a set of features of the corpus. A set of grammatical patterns are generated based on the extracted features. The set of grammatical patterns includes at least one grammatical pattern generated from an internal pattern and at least one grammatical pattern generated from an external pattern. The grammatical patterns of the set are organized into a hierarchy and/or are ranked. The hierarchy and/or ranking are visually displayed.


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