Sheng-Yung Chang

Title: Innovations of Sheng-Yung Chang in Semiconductor Technology.

Introduction

Sheng-Yung Chang is a notable inventor based in Hsinchu, Taiwan. He has made significant contributions to the field of semiconductor devices, particularly in work function tuning. His innovative approaches have the potential to enhance the performance and efficiency of semiconductor technologies.

Latest Patents

Sheng-Yung Chang holds a patent for a method that focuses on work function tuning in semiconductor devices. The patent describes a technique for forming a semiconductor device with a work function metal layer doped with tantalum. This method aims to mitigate oxygen diffusion and improve the device's threshold voltage. The process involves creating a gate dielectric layer on a channel structure, which includes an interfacial layer and a high-k dielectric layer. Additionally, the work function metal layer and the gate dielectric layer are both doped with tantalum to enhance their properties.

Career Highlights

Sheng-Yung Chang is associated with Taiwan Semiconductor Manufacturing Company Limited, a leading firm in the semiconductor industry. His work at this company has allowed him to contribute to cutting-edge technologies and advancements in semiconductor manufacturing.

Collaborations

Some of his notable coworkers include Hsin-Yi Lee and Cheng-Lung Hung. Their collaborative efforts in the field of semiconductor technology have further propelled innovations and research in this area.

Conclusion

Sheng-Yung Chang's contributions to semiconductor technology through his innovative patent demonstrate his expertise and commitment to advancing the field. His work continues to influence the development of more efficient semiconductor devices.