Beijing, China

Sheng Qi Zhang

This inventor holds 1 USPTO granted patent. Top assignee: Keysight Technologies, Inc.. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Sheng Qi Zhang. Retrieved from https://idiyas.com/inventor/sheng-qi-zhang

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


Average Co-Inventor Count = 1.0

ph-index = 1


Company Filing History:


Years Active: 2026

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1 patent (USPTO):Explore Patents

Title: Innovations of Sheng Qi Zhang

Introduction

Sheng Qi Zhang is a notable inventor based in Beijing, China. He has made significant contributions to the field of radio frequency technology. His work focuses on innovative systems that enhance the detection and measurement of RF signals.

Latest Patents

Sheng Qi Zhang holds a patent for a "Rectenna array for detecting power radiated pattern of microwave or millimeter-wave signals." This system is designed to measure the power radiated pattern of an incident radio frequency (RF) signal, which indicates the spatial distribution characteristics of a device under test (DUT). The system comprises multiple antenna elements arranged in an array, where each antenna is coupled to a diode. The unique design allows the antenna elements to operate in a detect mode, enabling precise measurements of RF signals.

Career Highlights

Sheng Qi Zhang is currently employed at Keysight Technologies, Inc., where he continues to develop innovative solutions in the field of RF technology. His expertise and contributions have positioned him as a key figure in his organization.

Collaborations

Some of his notable coworkers include Zhu Wen and Xiong Bin Liao. Their collaborative efforts contribute to the advancement of technology within their field.

Conclusion

Sheng Qi Zhang's innovative work in RF technology and his patent for a rectenna array demonstrate his commitment to advancing the field. His contributions are significant and continue to influence the industry.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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