Company Filing History:
Years Active: 2020-2025
Title: Innovator Sheng-Huan Tseng: Pioneering Chemical Mechanical Polishing Technology
Introduction: Sheng-Huan Tseng is a noteworthy inventor based in Hsinchu, Taiwan, known for his significant contributions to the field of chemical mechanical polishing (CMP) in semiconductor manufacturing. With a unique patent to his name, he has played a crucial role in advancing CMP methods that enhance the production quality of semiconductor wafers.
Latest Patents: Sheng-Huan Tseng holds one patent titled "Chemical Mechanical Polishing Pad." This innovative invention presents methods for polishing metal surfaces, such as copper or tungsten, found in semiconductor wafers. The patent outlines a CMP polishing pad composed of a reaction product from an isocyanate-terminated urethane prepolymer combined with specific curative components. The resulting polishing layer exhibits a water uptake of 4 to 8 wt. % after a week of immersion in deionized water, ensuring coplanar metal and dielectric layer surfaces with reduced defects and minimal dishing during the polishing process.
Career Highlights: Sheng-Huan Tseng is currently employed at Rohm and Haas Electronic Materials CMP Holdings, Inc., where he continues his work in semiconductor materials technology. His expertise in CMP has made him a valuable asset to the company, contributing to cutting-edge innovations that bolster the semiconductor manufacturing process.
Collaborations: Throughout his career, Sheng-Huan Tseng has collaborated with notable colleagues such as Bainian Qian and Fengji Yeh. Working alongside these talented professionals, he has engaged in various projects enhancing CMP technologies and methods within the semiconductor industry.
Conclusion: As an inventor, Sheng-Huan Tseng has made a remarkable impact in the realm of chemical mechanical polishing. His innovative patent plays a vital role in improving the semiconductor manufacturing process by providing methods that yield high-quality substrates with low defects. With continued collaborations and innovations, Tseng's contributions are sure to advance the industry further.