Sheng-Chieh Huang

Title: Sheng-Chieh Huang: Semiconductor Processing and Network Measurement Innovations.

Introduction

Sheng-Chieh Huang is an inventor based in Hsinchu, Taiwan. His work includes innovations in semiconductor manufacturing and methods for measuring network quality. Huang is associated with the Industrial Technology Research Institute and Taiwan Semiconductor Manufacturing Company Limited. His patent portfolio includes 2 patents.

Latest Patents

Huang’s latest patents address distinct engineering challenges.

“Focus Ring for a Plasma-Based Semiconductor Processing Tool” describes a focus ring designed to improve etch-rate uniformity across a wafer during plasma etching. Its angled inner wall directs plasma toward the wafer, while the ring’s geometry and inner diameter are intended to reduce overlapping plasma areas that can cause uneven etching. More uniform processing may help reduce structural variations in semiconductor devices and improve manufacturing yield.

“Network Quality Measurement Method and System” presents a method for measuring network quality throughout a space using a vehicle device. The system determines the device’s movement path and speed based on the space’s size and the device’s endurance time, then collects network-quality data as the device moves. It can adjust the path, speed, or measurement frequency when network conditions change or an obstacle is detected.

Career Highlights

Huang’s listed organizational affiliations connect his work with semiconductor manufacturing and applied technology research. The focus-ring invention addresses process control in wafer fabrication, while the network-measurement invention applies mobile sensing to assess connectivity across an area.

Collaborations

Huang’s listed coworkers include Hui-Ping Kuo and Hsin-Hui Hwang. His affiliations include the Industrial Technology Research Institute and Taiwan Semiconductor Manufacturing Company Limited.

Conclusion

Sheng-Chieh Huang’s inventions span wafer etch uniformity and mobile network-quality measurement, reflecting contributions to both semiconductor processing and technology assessment.