Taichung, Taiwan

Shen-Yu Chang

This inventor holds 2 USPTO granted patents. Top assignee: IV Technologies Co., Ltd.. Active years: 2011-2013.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Shen-Yu Chang. Retrieved from https://idiyas.com/inventor/shen-yu-chang

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 3.0

ph-index = 1

Forward Citations = 2(Granted Patents)


Company Filing History:


Years Active: 2011-2013

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2 patents (USPTO):Explore Patents

Title: Innovations of Shen-Yu Chang

Introduction

Shen-Yu Chang is a notable inventor based in Taichung, Taiwan. He has made significant contributions to the field of polishing pad technology, holding two patents that showcase his innovative approach to fabrication methods.

Latest Patents

His latest patents include a method of fabricating a polishing pad. This invention involves creating a polishing pad with a compressibility-aiding stripe embedded within it. The process consists of assembling the stripe in a mold cavity, filling it with a polymer material, and subsequently releasing the polishing pad from the mold. Another patent focuses on a polishing pad and its fabrication method, which features a polishing pad body and at least one compressibility-aiding stripe. This stripe, which is buried in the polishing pad body, possesses a greater compressibility than the body itself.

Career Highlights

Shen-Yu Chang is associated with Iv Technologies Co., Ltd., where he continues to develop and refine his inventions. His work has contributed to advancements in polishing pad technology, enhancing the efficiency and effectiveness of these products.

Collaborations

He collaborates with talented coworkers, including Yung-Chung Chang and Wen-Chang Shih, who contribute to the innovative environment at Iv Technologies Co., Ltd.

Conclusion

Shen-Yu Chang's contributions to polishing pad technology through his patents reflect his dedication to innovation and improvement in the field. His work continues to influence the industry and inspire future advancements.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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