Company Filing History:
Years Active: 2006-2007
Title: The Innovative Contributions of Sheila Gombar-Fetner
Introduction
Sheila Gombar-Fetner is a notable inventor based in Midland, MI (US), known for her impactful contributions to the field of microelectronics. With a total of two patents to her name, her work has significantly advanced the techniques used in the fabrication of microelectronic devices.
Latest Patents
Gombar-Fetner's latest patents focus on the use of organosilicate resins as hardmasks in organic polymer dielectrics. The first patent describes a method for creating a composition through the hydrolysis of a silane with an unsaturated group alongside a silane with an aromatic group. In this innovative method, the more reactive silane is continuously added during the hydrolysis of the less reactive one, resulting in a composition that is particularly useful as a hardmask or etch stop in microelectronic fabrication.
Her second patent further enhances this field by outlining a method that begins with providing a substrate and forming a first layer on it, which has a dielectric constant of less than 3.0 and comprises an organic polymer. The method then involves applying an organosilicate resin over the first layer, subsequently removing part of this resin to expose the underlying layer for additional processing. This innovation not only streamlines the fabrication process but also enhances the performance of integrated circuits by integrating active substrates and electrical interconnect structures.
Career Highlights
Sheila Gombar-Fetner is currently associated with Dow Global Technologies LLC, where she applies her expertise in materials science to develop cutting-edge technologies. Her work has greatly contributed to the advancement of microelectronic devices, showcasing her ability to merge innovation with practical applications in a crucial industry.
Collaborations
In her professional journey, Gombar-Fetner has collaborated with esteemed colleagues, including Paul H. Townsend III and Lynne K. Mills. These collaborations demonstrate her ability to work alongside other experts to push the boundaries of innovation and research in material sciences.
Conclusion
Sheila Gombar-Fetner stands out as a significant figure in the innovation landscape within the microelectronics industry. Her patents not only highlight her creative problem-solving skills but also demonstrate the tangible benefits her inventions bring to technological advancements. As she continues her work at Dow Global Technologies LLC, her contributions are sure to influence the future of microelectronic device fabrication.