Company Filing History:
Years Active: 2018-2023
Title: Shay Attal: Innovator in Metrology and Lithography
Introduction
Shay Attal is a prominent inventor based in Rehovot, Israel. She has made significant contributions to the fields of metrology and lithography, holding a total of 5 patents. Her innovative work focuses on enhancing measurement techniques and defect detection in lithographic masks.
Latest Patents
One of Shay Attal's latest patents is titled "Image acquisition by an electron beam examination tool for metrology measurement." This patent describes a system and method for obtaining a sequence of frames of a specimen area, transforming frames, and generating corrected images based on structural features. Another notable patent is "System and methods of generating comparable regions of a lithographic mask." This invention provides methods for creating in-die references for die-to-die defect detection, utilizing similar blocks of a lithographic mask defined by CAD information.
Career Highlights
Shay Attal is currently employed at Applied Materials Israel Limited, where she continues to develop innovative solutions in her field. Her work has been instrumental in advancing technologies that improve measurement accuracy and defect detection processes.
Collaborations
Shay collaborates with talented individuals such as Boaz Cohen and Vladislav Kaplan, contributing to a dynamic work environment that fosters innovation and creativity.
Conclusion
Shay Attal's contributions to metrology and lithography through her patents and collaborative efforts highlight her role as a leading inventor in her field. Her work continues to influence advancements in technology and measurement techniques.