Shao-En Hwang

Title: Innovations of Shao-En Hwang in Solder Resistant Composition

Introduction

Shao-En Hwang is a notable inventor based in Taipei, Taiwan. He has made significant contributions to the field of materials science, particularly in the development of solder resistant compositions for printed circuit boards. His innovative work has led to the creation of a patented composition that enhances the performance and reliability of electronic devices.

Latest Patents

Shao-En Hwang holds a patent for a low dielectric constant (Dk) and dissipation factor (Df) solder resistant composition. This composition is designed for use in printed circuit boards and comprises several key components, including a photopolymerizable prepolymer, a vinyl monomer, an epoxy compound, a photopolymerization initiator, an inorganic filler, a catalyst, and an organic solvent. The resulting solder resistant mask composition exhibits excellent photo and thermocurability, along with high developability resolution when exposed to an alkaline aqueous solution. Notably, the dielectric constant is below 3.20 at 1 GHz, and the dissipation factor is less than 0.015 at the same frequency.

Career Highlights

Shao-En Hwang is currently employed at Nan Ya Plastics Corporation, where he continues to innovate and develop advanced materials. His work has been instrumental in improving the quality and efficiency of electronic components, making them more reliable for various applications.

Collaborations

Throughout his career, Shao-En Hwang has collaborated with talented individuals such as Cheng-Chung Lee and Yeong-Tong Hwang. These collaborations have fostered a creative environment that encourages the exchange of ideas and the development of cutting-edge technologies.

Conclusion

Shao-En Hwang's contributions to the field of solder resistant compositions have made a significant impact on the electronics industry. His innovative patent showcases his expertise and commitment to advancing technology.