This inventor holds 2 USPTO granted patents. Top assignee: Applied Materials, Inc.. Active years: 2002-2009.
Location History:
- Milpitas, CA (US) (2002)
- Milpitas, IN (2009)
Company Filing History:
Years Active: 2002-2009
Title: **Innovative Contributions of Shankar N Chandran in the Field of Plasma Cleaning**
Introduction
Shankar N Chandran, an esteemed inventor based in Milpitas, IN, has made significant strides in the field of plasma technology through his innovative patents. With a total of two patents to his name, Chandran's work has provided impactful solutions for enhancing processing chamber cleanliness in various industrial applications.
Latest Patents
One of Shankar's latest patents, titled "Accelerated Plasma Clean," introduces a novel method and apparatus that significantly reduces the time required to clean a processing chamber using a reactive plasma cleaning process. In this cutting-edge invention, a plasma is generated in an Astron fluorine source generator from a flow of substantially pure inert-source gas. Following the formation of the plasma, a fluorine source gas is carefully introduced, ensuring that the fluorine source flow accelerates at a controlled rate of no more than 1.67 standard cubic centimeters per second (scc/s). This innovative approach results in a plasma enriched with a variety of radicals and dissociated inert-source gas atoms, forming an effective cleaning mixture. Notably, the invention maintains a ratio of inert-source gas to fluorine source that exceeds 1:1, showcasing a strategic enhancement in cleaning efficiency.
Career Highlights
Shankar N Chandran is currently employed at Applied Materials, Inc., where his expertise in plasma technology plays a vital role in advancing the company's offerings in the semiconductor industry. His contributions have been fundamental in developing more effective cleaning processes that conform to the high standards required in manufacturing environments.
Collaborations
Throughout his career, Chandran has collaborated with notable professionals such as Scott A Hendrickson and Gwendolyn D Jones. These collaborative efforts have not only enriched his work but have also fostered a shared environment of innovation and problem-solving within the company.
Conclusion
In conclusion, Shankar N Chandran stands out as an influential inventor in the realm of plasma cleaning technologies. His patent contributions, particularly the "Accelerated Plasma Clean," demonstrate his commitment to innovation and efficiency. Through his role at Applied Materials, Inc. and collaborations with his colleagues, Chandran continues to significantly impact the industry, paving the way for advancements in processing chamber cleaning methodologies.