Sez-An Wu

Title: Innovations by Inventor Sez-An Wu in Semiconductor Technology

Introduction

Sez-An Wu, an accomplished inventor based in Hsin-Chu, Taiwan, has made significant contributions to the field of semiconductor technology. With a total of two patents to his name, Wu's work focuses on enhancing copper surface treatments to improve efficiency in semiconductor devices.

Latest Patents

Sez-An Wu's latest patents reflect his innovative approach to overcoming challenges in semiconductor manufacturing. The first patent pertains to a method for treating copper surfaces, addressing the issue of hillock formation during high-temperature operations. By exposing the copper surface to a citric acid solution after the chemical mechanical polishing (CMP) process, this method effectively removes copper oxides and prevents the formation of hillocks. The subsequent annealing and NH plasma treatment further enhance adhesion for dielectric films, ensuring a high-quality, oxide-free surface.

His second patent involves the formation of a metal nitride layer over exposed copper surfaces using a plasma-enhanced Chemical Vapor Deposition (CVD) process. This method enhances adhesion, minimizes copper hillock formation, and employs a preheating step along with in-situ plasma sputtering to eliminate copper oxides prior to the deposition.

Career Highlights

Wu has made a name for himself at Taiwan Semiconductor Manufacturing Company Limited (TSMC), a leader in the semiconductor industry. His innovative approaches and patent contributions demonstrate his commitment to advancing technology in semiconductor manufacturing.

Collaborations

Sez-An Wu has notably collaborated with esteemed colleagues Yi-Lung Cheng and Wen-Kung Cheng. Together, they have pooled their expertise to push the boundaries of semiconductor technologies, contributing to groundbreaking advancements within their field.

Conclusion

Sez-An Wu's inventions and patents play a crucial role in enhancing semiconductor manufacturing processes. His dedication to innovation and collaboration signifies his impact on the industry, paving the way for further advancements in semiconductor technology.