This inventor holds 1 USPTO granted patent and 1 published patent application. Top assignee: Intel Corporation. Active years: 2024.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2024
Title: Seyedhamed M. Barghi: Innovator in EUV Direct Print Processes
Introduction
Seyedhamed M. Barghi, an accomplished inventor based in North Plains, Oregon, holds a significant patent that contributes to advancements in Extreme Ultraviolet (EUV) lithography. With a focus on enhancing grating aligned patterning, Barghi's innovative methods are crucial in the semiconductor manufacturing process.
Latest Patents
Barghi's sole patent, titled "Enhanced Grating Aligned Patterning for EUV Direct Print Processes," outlines a detailed methodology for patterning the back end of line (BEOL) stacks. The invention describes the formation of a grating over an interlayer dielectric (ILD) and the creation of a selectively etched spacer over this grating. The method also involves disposing a hardmask, patterning it, and filling openings with a plug to protect portions of the spacer during etching. This sophisticated approach enables the transfer of the grating into the ILD through an effective etching process.
Career Highlights
Seyedhamed M. Barghi is currently associated with Intel Corporation, a global leader in semiconductor manufacturing. His work in the field focuses on enhancing processes that are crucial for producing high-performance chips. Barghi's expertise in advanced lithography techniques positions him as a key contributor to significant technological advancements in the industry.
Collaborations
Throughout his career, Barghi has collaborated with notable coworkers such as Shyam Benegal Kadali and Marvin Y Paik. These collaborations enhance the innovative efforts at Intel Corporation, fostering an environment that encourages the development of groundbreaking technologies in semiconductor manufacturing.
Conclusion
Seyedhamed M. Barghi is a distinguished inventor whose work on EUV direct print processes demonstrates the potential for innovation in the complex field of semiconductor manufacturing. With his patented techniques, Barghi continues to shape the future of technology, making significant contributions to the industry through his collaboration and expertise.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
