Iksan, South Korea

Seungsoo Lee

This inventor holds 1 USPTO granted patent. Top assignees: Dongwoo Fine-Chem Co., Ltd., Samsung Display Co., Ltd.. Active years: 2019.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Seungsoo Lee. Retrieved from https://idiyas.com/inventor/seungsoo-lee-l44vm964

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 9.0

ph-index = 1

Forward Citations = 1(Granted Patents)


Company Filing History:


Years Active: 2019

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1 patent (USPTO):Explore Patents

Title: Seungsoo Lee: Innovator in Etchant Composition

Introduction

Seungsoo Lee is a notable inventor based in Iksan, South Korea. He has made significant contributions to the field of semiconductor manufacturing, particularly through his innovative patent related to etchant compositions.

Latest Patents

Seungsoo Lee holds a patent for an etchant composition and method of manufacturing a thin film transistor substrate. This patent includes a unique formulation that consists of various components, such as persulfate, fluorine compounds, inorganic acids, cyclic amine compounds, chlorine compounds, aliphatic sulfonic acids, and organic acids or their salts, all combined with water. This innovative composition is designed to enhance the manufacturing process of thin film transistors.

Career Highlights

Throughout his career, Seungsoo Lee has worked with prominent companies in the industry. He has been associated with Dongwoo Fine-Chem Co., Ltd. and Samsung Display Co., Ltd., where he has contributed his expertise in chemical compositions and manufacturing processes.

Collaborations

Seungsoo Lee has collaborated with talented individuals in his field, including Youngjun Kim and Soomin An. These collaborations have likely enriched his work and contributed to the development of innovative solutions in semiconductor technology.

Conclusion

Seungsoo Lee's contributions to the field of etchant compositions demonstrate his commitment to innovation in semiconductor manufacturing. His patent reflects a significant advancement in the technology, showcasing his expertise and dedication to the industry.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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