This inventor holds 1 USPTO granted patent and 2 published patent applications. Top assignee: Industry-University Cooperation Foundation Hanyang University. Active years: 2026.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2026
Title: Seungchan Moon and EUV Mask Material Measurement
Introduction
Seungchan Moon is an inventor based in Seoul, South Korea. His work includes a patent for measuring optical properties of extreme ultraviolet (EUV) mask materials. He is associated with the Industry-University Cooperation Foundation Hanyang University.
Latest Patents
Moon is named on 1 patent: “Device and Method for Measuring Refraction Coefficient and Extinction Coefficient of EUV Mask Material.” The invention describes a device that generates EUV light and directs it toward a target, where the light is transmitted and reflected. A reflector beneath the target reflects transmitted light, and a detector collects the returning light alongside light reflected from the target to identify an interference pattern. By comparing patterns measured through targets of different thicknesses, the device can determine the target material’s refraction coefficient and extinction coefficient.
Career Highlights
Moon’s patent focuses on characterizing EUV mask materials through interference measurements. Such measurements can help assess optical properties relevant to the development and evaluation of materials used in EUV lithography.
Collaborations
Moon’s listed coworkers include Jinho Ahn and Dong Gi Lee. His patent is associated with the Industry-University Cooperation Foundation Hanyang University.
Conclusion
Seungchan Moon’s recorded invention presents an interference-based approach to measuring the refraction and extinction coefficients of EUV mask materials.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile