The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 27, 2026
Filed:
May. 25, 2023
Iucf-hyu (Industry-university Cooperation Foundation Hanyang University), Seoul, KR;
Jinho Ahn, Seoul, KR;
Dong Gi Lee, Seoul, KR;
Young Woong Kim, Seoul, KR;
Seungchan Moon, Seoul, KR;
Jin Hyuk Choi, Seoul, KR;
Abstract
Provided is a device for measuring a refraction coefficient and an extinction coefficient. The device for measuring a refraction coefficient and an extinction coefficient may comprise: a light source for generating EUV light; a target for transmitting and reflecting the EUV light generated from the light source; a reflector disposed under the target to reflect the EUV light having been transmitted through the target; and a detector for detecting an interference pattern by collecting the EUV light having re-transmitted through the target after being reflected from the reflector and the EUV light reflected from the target, wherein a refraction coefficient and an extinction coefficient of the target may be detected by comparing a first interference pattern detected through the target and having a first thickness with a second interference pattern detected through the target and having a second thickness.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile