Suwon, South Korea

Seung Won Yoon

This inventor holds 1 USPTO granted patent. Top assignee: Samsung Electronics Co., Ltd.. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Seung Won Yoon. Retrieved from https://idiyas.com/inventor/seung-won-yoon

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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Average Co-Inventor Count = 1.0

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Company Filing History:


Years Active: 2026

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1 patent (USPTO):Explore Patents

Title: Seung Won Yoon and Semiconductor Wafer-Cleaning Technology.

Introduction

Seung Won Yoon is an inventor associated with Suwon, South Korea, and Samsung Electronics Co., Ltd. His patent work addresses wafer-cleaning equipment used in semiconductor manufacturing.

Latest Patents

Yoon is credited with 1 patent: “Wafer Cleaning Apparatus and Wafer Cleaning System Including the Same.” The invention describes an apparatus with a plate, connecting parts, and serrated features arranged to support wafer cleaning. Its design specifies the geometry and spacing of these components, including a guide part shaped from a circle cut along two chords, a holder connecting part, and a support part. The patent also details how the serrated parts connect to one another and to the plate, with defined distances intended to guide the apparatus’s structure.

Career Highlights

Yoon’s listed patent reflects work related to semiconductor manufacturing equipment at Samsung Electronics. The invention focuses on the structural design of a wafer-cleaning apparatus and its integration into a wafer-cleaning system.

Collaborations

Tae Woong Um and Young Ju Kwon are identified as Yoon’s coworkers. The available information does not specify their roles in the patent or whether they collaborated on this invention.

Conclusion

Seung Won Yoon’s patent concerns the design of wafer-cleaning equipment for semiconductor manufacturing, highlighting a technical contribution associated with Samsung Electronics.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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