Seung-Min Lee

Seung-Min Lee is an inventive individual based in Suwon-si, South Korea. He has an impressive portfolio of 13 patents to his name. One of his latest patents is related to an etching method and methods of manufacturing semiconductor devices using the same. This method involves treating the etching-object with a plasma of a fluorocarbon gas and an inert gas, resulting in the formation of a deposition layer. The etching reaction of the silicon oxide is then activated using a plasma of an inert gas, and any etching reaction products are subsequently removed using a plasma of an inert gas and an oxygen-containing gas.

Another notable invention by Seung-Min Lee is in the field of vertical semiconductor devices. This vertical memory device consists of a conductive pattern structure, a pad structure, multiple channel structures, and dummy structures. The conductive pattern structure extends in a first direction within a first region of the substrate. The pad structure is located in a second region adjacent to the first region and makes contact with the conductive pattern structure. The channel structures are arranged regularly on the substrate and extend through the conductive pattern structure. The first dummy structures are positioned in a portion of the first region adjacent to the second region, and the second dummy structures extend through the pad structure on the substrate.

Seung-Min Lee is affiliated with Samsung Electronics Co., Ltd., a renowned multinational electronics company.

Among his colleagues, Hoo-Sung Cho and Jeong-Seok Nam stand out as individuals who have worked alongside Seung-Min Lee on various projects. Together, they contribute to the innovative advancements made by Samsung Electronics Co., Ltd.

Seung-Min Lee's ingenious inventions and collaborative efforts with his coworkers showcase his significant contributions to the field of semiconductor manufacturing and design.