Seoul, South Korea

Seung Kyu Lim

This inventor holds 1 USPTO granted patent and 2 published patent applications. Top assignee: Samsung Electronics Co., Ltd.. Active years: 2024.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Seung Kyu Lim. Retrieved from https://idiyas.com/inventor/seung-kyu-lim-mepoh7f8

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank
USPTO Granted Patents = 1 

% Patents Active = 100.0

Average Co-Inventor Count = 8.0

ph-index = 1


Company Filing History:


Years Active: 2024

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1 patent (USPTO):Explore Patents

Title: Seung Kyu Lim: Innovator in Plasma Processing Technology

Introduction

Seung Kyu Lim is a notable inventor based in Seoul, South Korea. He has made significant contributions to the field of plasma processing technology, particularly through his innovative patent.

Latest Patents

Seung Kyu Lim holds a patent for a plasma processing apparatus. This apparatus includes a lower electrode that supports a wafer, a focus ring surrounding the edge of the lower electrode, and an edge ring positioned lower than the focus ring. The focus ring is designed with a lower region and an upper region, where the upper region increases in electrical conductivity as it approaches the lower region. This innovation enhances the efficiency of plasma processing.

Career Highlights

Seung Kyu Lim is currently employed at Samsung Electronics Co., Ltd., a leading technology company known for its advancements in electronics and innovation. His work at Samsung has allowed him to contribute to cutting-edge technologies in the semiconductor industry.

Collaborations

Some of his notable coworkers include Jun Soo Lee and Yoshihisa Hirano, who have also made significant contributions to the field of plasma processing and semiconductor technology.

Conclusion

Seung Kyu Lim's innovative work in plasma processing technology exemplifies the spirit of invention and collaboration in the tech industry. His contributions continue to influence advancements in semiconductor manufacturing.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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