The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 22, 2024
Filed:
Oct. 27, 2022
Samsung Electronics Co., Ltd., Suwon-si, KR;
Jun Soo Lee, Seoul, KR;
Yoshihisa Hirano, Suwon-si, JP;
Jae Hoon Kim, Seoul, KR;
Young Jin Noh, Ansan-si, KR;
Sung Moon Park, Seongnam-si, KR;
Seung Kyu Lim, Seoul, KR;
Kyeong Seok Jeong, Hwaseong-si, KR;
Hyung Kyu Choi, Seoul, KR;
SAMSUNG ELECTRONICS CO., LTD., Suwon-si, KR;
Abstract
A plasma processing apparatus may include a lower electrode supporting a wafer; a focus ring surrounding an edge of the lower electrode and having a ring shape; and an edge ring disposed in a position lower than a position of the focus ring. The focus ring may include a lower region and an upper region disposed on the lower region, and the upper region increases in electrical conductivity as the upper region is closer to the lower region.