Suwon-si, Japan

Yoshihisa Hirano

USPTO Granted Patents = 1 

Average Co-Inventor Count = 8.0

ph-index = 1


Company Filing History:


Years Active: 2024

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1 patent (USPTO):Explore Patents

Title: Innovations of Yoshihisa Hirano

Introduction

Yoshihisa Hirano is a notable inventor based in Suwon-si, Japan. He has made significant contributions to the field of plasma processing technology. His innovative work has led to the development of a unique plasma processing apparatus.

Latest Patents

Hirano holds 1 patent for his invention titled "Plasma processing apparatus." This apparatus includes a lower electrode that supports a wafer, a focus ring surrounding the edge of the lower electrode, and an edge ring positioned lower than the focus ring. The design of the focus ring features a lower region and an upper region, with the upper region increasing in electrical conductivity as it approaches the lower region.

Career Highlights

Yoshihisa Hirano is currently employed at Samsung Electronics Co., Ltd., a leading company in the electronics industry. His work at Samsung has allowed him to push the boundaries of plasma processing technology and contribute to advancements in semiconductor manufacturing.

Collaborations

Hirano has collaborated with several talented individuals in his field, including Jun Soo Lee and Jae Hoon Kim. These collaborations have fostered innovation and have been instrumental in the development of new technologies.

Conclusion

Yoshihisa Hirano's contributions to plasma processing technology exemplify the spirit of innovation. His patent and work at Samsung Electronics Co., Ltd. highlight his role as a key figure in advancing technology in the semiconductor industry.

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