Seung Hwan Lee

Title: Seung Hwan Lee: Innovator in Substrate Processing Technology

Introduction

Seung Hwan Lee is a notable inventor based in Anseong-si, South Korea. He has made significant contributions to the field of substrate processing technology, holding a total of 2 patents. His work focuses on improving the efficiency and stability of substrate processing methods.

Latest Patents

Lee's latest patents include a substrate supporting apparatus and a substrate processing apparatus that incorporates innovative methods for substrate handling. One of his key inventions is a substrate processing method capable of stably loading a substrate regardless of variations in pressure within a reaction space. This method involves supplying an inert gas and forming a thin film by sequentially and repeatedly supplying a source gas, a reaction gas, and activating the reaction gas. The design ensures that the center portion of a substrate and the center portion of a susceptor are spaced apart, creating a separate space that communicates with the reaction space through one or more channels. The introduction of inert gas into this separate space helps prevent pressure imbalances during the thin film deposition process.

Career Highlights

Seung Hwan Lee is currently employed at Asm IP Holding B.V., where he continues to develop innovative solutions in substrate processing. His expertise in this area has positioned him as a key figure in advancing semiconductor technologies.

Collaborations

Lee collaborates with talented colleagues, including Ju Hyuk Park and Hak Yong Kwon, who contribute to the innovative projects at Asm IP Holding B.V.

Conclusion

Seung Hwan Lee's contributions to substrate processing technology highlight his role as an influential inventor in the semiconductor industry. His patents reflect a commitment to enhancing the efficiency and stability of substrate processing methods.