This inventor holds 3 USPTO granted patents and 1 published patent application. Top assignee: Applied Materials, Inc.. Active years: 2017-2025.
Location History:
- Santa Clara, CA (US) (2017)
- San Jose, CA (US) (2022)
Company Filing History:
Years Active: 2017-2025
Title: Seul Ki Ahn: Innovator in Substrate Etching Technology
Introduction
Seul Ki Ahn is a prominent inventor based in Santa Clara, CA (US). He has made significant contributions to the field of substrate etching technology, holding a total of 3 patents. His work focuses on improving processes within etch reactors, which are crucial in semiconductor manufacturing.
Latest Patents
One of Seul Ki Ahn's latest patents is an integrated cleaning process for substrate etching. This method involves removing etchant byproducts from an etch reactor and discharging a substrate from an electrostatic chuck. The process begins with etching one or more layers on a substrate that is electrostatically secured to an electrostatic chuck within the chamber of the etch reactor. A first plasma is used to etch the substrate, generating etchant byproducts. After the etching is complete, a second plasma is introduced into the chamber to trim the photoresist and remove a portion of the etchant byproduct. The substrate is then electrostatically discharged and removed from the chamber.
Another patent by Ahn also focuses on an integrated cleaning process for substrate etching. In this method, a substrate is electrostatically secured within the chamber of an etch reactor. A first plasma etches the substrate, generating etchant byproducts. After etching, a second plasma, which contains oxygen, is provided to remove the etchant byproducts and discharge the substrate. This innovative approach allows for the insertion of a second substrate into the chamber without the need for in-situ cleaning between the removal of the first substrate and the insertion of the second.
Career Highlights
Seul Ki Ahn is currently employed at Applied Materials, Inc., a leading company in the semiconductor equipment industry. His work has been instrumental in advancing the efficiency and effectiveness of substrate etching processes.
Collaborations
Throughout his career, Ahn has collaborated with notable colleagues, including Seung-Young Son and Yi Zhou. These collaborations have contributed to the development of innovative solutions in the field of semiconductor manufacturing.
Conclusion
Seul Ki Ahn's contributions to substrate etching technology have made a significant impact on the semiconductor industry. His innovative patents and work at Applied Materials, Inc. highlight his role as a key inventor in this field.
