Hayward, CA, United States of America

Serguei Anikitichev


Average Co-Inventor Count = 4.0

ph-index = 1

Forward Citations = 2(Granted Patents)


Company Filing History:


Years Active: 2017

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1 patent (USPTO):Explore Patents

Title: Innovations by Serguei Anikitichev in Laser Annealing Technology

Introduction

Serguei Anikitichev is an accomplished inventor based in Hayward, California. He has made significant contributions to the field of laser technology, particularly in the area of laser annealing. His innovative work has led to the development of a patented system that addresses critical challenges in this domain.

Latest Patents

Serguei Anikitichev holds a patent for "Systems and methods for reducing beam instability in laser annealing." This patent outlines a method that includes directing a conditioned laser beam through an opening in an aperture using a beam-redirecting element. The process involves forming a line image on the surface of a semiconductor wafer, which locally heats the surface to create an annealing temperature distribution. The method further includes detecting thermal emissions from the heated wafer surface and adjusting the beam-redirecting element to minimize beam instability.

Career Highlights

Serguei Anikitichev is currently associated with Ultratech, Inc., where he continues to innovate and develop advanced technologies. His work has been instrumental in enhancing the efficiency and effectiveness of laser annealing processes. With a focus on practical applications, he has contributed to the advancement of semiconductor manufacturing techniques.

Collaborations

Serguei has collaborated with notable colleagues, including James McWhirter and Andrew M. Hawryluk. These partnerships have fostered a collaborative environment that encourages the exchange of ideas and expertise in the field of laser technology.

Conclusion

Serguei Anikitichev's contributions to laser annealing technology exemplify the impact of innovative thinking in engineering. His patented methods not only address existing challenges but also pave the way for future advancements in semiconductor manufacturing.

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