Sergey V Uzhakov

Title: Innovations of Sergey V Uzhakov

Introduction

Sergey V Uzhakov is a notable inventor based in Moscow, Russia. He has made significant contributions to the field of aerial image simulation and optical proximity correction (OPC) mask analysis. With a total of 2 patents, Uzhakov's work showcases his expertise and innovative approach to solving complex problems in technology.

Latest Patents

Uzhakov's latest patents include a method and system for improving aerial image simulation speeds. This invention involves receiving a mask and generating a matrix of node values based on the mask. The method performs a one-dimensional approximation of first approximation values and a two-dimensional approximation of second approximation values using Chebyshev polynomials. This innovative approach results in high-resolution aerial images generated at faster speeds. Another significant patent is a method and system for analyzing the quality of an OPC mask. This invention classifies cells of the target layer and the OPC mask layer, simulates the OPC mask layer, and measures edge placement errors (EPEs) to ensure high-quality output.

Career Highlights

Throughout his career, Uzhakov has worked with prominent companies such as LSI Logic Corporation and LSI Corporation. His experience in these organizations has contributed to his development as an inventor and has allowed him to refine his skills in technology and innovation.

Collaborations

Uzhakov has collaborated with notable colleagues, including Stanislav V Aleshin and Marina Igorevna Medvedeva. These partnerships have likely fostered a creative environment that encourages the exchange of ideas and advancements in their respective fields.

Conclusion

Sergey V Uzhakov is a distinguished inventor whose work in aerial image simulation and OPC mask analysis has made a significant impact in technology. His innovative patents and collaborations highlight his commitment to advancing the field.