Sergey Starik

Title: The Innovations of Sergey Starik

Introduction

Sergey Starik is a notable inventor based in Kyiv, Ukraine. He has made significant contributions to the field of optical metrology, particularly in the area of film thickness measurements. His innovative approach combines advanced measurement techniques with machine learning algorithms to enhance the accuracy of optical models.

Latest Patents

Sergey holds a patent for "Optical metrology models for in-line film thickness measurements." This invention involves generating an optical metrology model for in-line thickness measurements of a film overlying non-ideal structures on a substrate. The process includes performing pre-measurements before the deposition of the film and post-measurements afterward. These measurements are conducted at various polarization angles and orientations of the substrate. By analyzing the differences in reflectance between the pre- and post-measurements, Sergey identifies conditions that minimize the influence of non-ideal structures. The optical metrology model is then created using these identified parameters as inputs to a machine-learning algorithm. Sergey has 1 patent to his name.

Career Highlights

Sergey is currently employed at Applied Materials Israel Limited, where he continues to develop innovative solutions in the field of optical metrology. His work is characterized by a strong emphasis on precision and the integration of cutting-edge technology.

Collaborations

Some of his notable coworkers include Eric Chin Hong Ng and Edward Budiarto, who contribute to the collaborative environment that fosters innovation at Applied Materials.

Conclusion

Sergey Starik's contributions to optical metrology exemplify the intersection of technology and innovation. His work not only advances the field but also sets a foundation for future developments in film thickness measurement techniques.