Kyiv, Ukraine

Sergey Starik

USPTO Granted Patents = 9 

Average Co-Inventor Count = 16.4

ph-index = 3

Forward Citations = 68(Granted Patents)


Location History:

  • Kyiv, UA (2016)
  • Kiev, UA (2015 - 2024)

Company Filing History:


Years Active: 2015-2024

where 'Filed Patents' based on already Granted Patents

9 patents (USPTO):

Title: The Innovations of Sergey Starik

Introduction

Sergey Starik is a prominent inventor based in Kyiv, Ukraine. He has made significant contributions to the field of technology, particularly in the area of plasma-enhanced chemical vapor deposition (PECVD) processes. With a total of nine patents to his name, Starik continues to push the boundaries of innovation.

Latest Patents

One of Sergey Starik's latest patents involves a method of processing a substrate according to a PECVD process. This method includes adjusting the temperature profile of the substrate to change the deposition rate profile across the substrate. Additionally, the plasma density profile is adjusted to influence the deposition rate profile. The chamber surfaces exposed to the plasma are heated to enhance plasma density uniformity and minimize the formation of low-quality deposits on the chamber surfaces. In situ metrology may be employed to monitor the progress of the deposition process and trigger control actions involving substrate temperature profile, plasma density profile, pressure, temperature, and flow of reactants.

Career Highlights

Sergey Starik is currently associated with Applied Materials, Inc., a leading company in the field of materials engineering. His work at this organization has allowed him to develop and refine his innovative techniques in substrate processing.

Collaborations

Throughout his career, Sergey has collaborated with notable professionals in the industry, including Ganesh Balasubramanian and Todd J Egan. These collaborations have further enriched his work and contributed to the advancement of technology in his field.

Conclusion

Sergey Starik's contributions to the field of PECVD processes and his impressive portfolio of patents highlight his role as a key innovator in technology. His ongoing work continues to inspire advancements in materials engineering.

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