Moscow, Russia

Sergei Nicolaevich Chvalun

This inventor holds 1 USPTO granted patent. Top assignee: Hitachi, Ltd.. Active years: 2005.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Sergei Nicolaevich Chvalun. Retrieved from https://idiyas.com/inventor/sergei-nicolaevich-chvalun

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

Average Co-Inventor Count = 7.0

ph-index = 1

Forward Citations = 4(Granted Patents)


Company Filing History:


Years Active: 2005

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1 patent (USPTO):Explore Patents

Title: The Innovations of Sergei Nicolaevich Chvalun

Introduction

Sergei Nicolaevich Chvalun is a notable inventor based in Moscow, Russia. He has made significant contributions to the field of semiconductor technology. His work focuses on the development of advanced materials that enhance the performance of electronic devices.

Latest Patents

Chvalun holds a patent for a "Polyparaxylylene film, production method therefor and semiconductor device." This invention features an organic polymer film characterized by a low dielectric constant and high heating resistance. The film serves as an insulating layer in semiconductor devices, providing improved functionality and reliability. The manufacturing method for this film is also included in the patent, showcasing Chvalun's innovative approach to material science.

Career Highlights

Chvalun is currently employed at Hitachi, Ltd., where he continues to push the boundaries of semiconductor technology. His work at Hitachi has allowed him to collaborate with leading experts in the field, further enhancing his contributions to innovation.

Collaborations

Some of Chvalun's notable coworkers include Akio Takahashi and Yuichi Satsu. Their collaboration has fostered an environment of creativity and innovation, leading to advancements in semiconductor materials and devices.

Conclusion

Sergei Nicolaevich Chvalun's contributions to the field of semiconductor technology are significant and impactful. His patented innovations demonstrate his expertise and commitment to advancing electronic materials. Chvalun's work continues to influence the industry and pave the way for future developments.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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