Seong-Woon Choi is a prominent inventor based in Suwon, South Korea. He has made significant contributions to the field of photolithography, particularly in the development of masks used for measuring flare in projection lenses. With a total of 8 patents to his name, Choi's work has advanced the precision and efficiency of photolithographic processes.

Latest Patents

Choi's latest patents include a mask for use in measuring flare, a method of manufacturing the mask, a method of identifying flare-affected regions on wafers, and a method of designing new masks to correct for flare. These innovations provide a comprehensive approach to quantifying flare produced by projection lenses in photolithography systems. The first photolithographic process involves forming photoresist patterns on a test wafer using a specially designed mask. By comparing the patterns formed through different regions of the mask, Choi's methods allow for the identification of flare-affected areas and enable the formation of uniform photoresist patterns.

Career Highlights

Choi is currently employed at Samsung Electronics Co., Ltd., where he continues to push the boundaries of photolithography technology. His work has been instrumental in enhancing the performance of photomasks, ensuring that critical dimensions meet desired uniformity and accuracy.

Collaborations

Choi collaborates with notable colleagues such as Tae-Moon Jeong and Jung-Min Sohn, contributing to a dynamic research environment that fosters innovation in the field.

Conclusion

Seong-Woon Choi's contributions to photolithography through his innovative patents and collaborative efforts at Samsung Electronics Co., Ltd. highlight his role as a key figure in advancing this critical technology. His work continues to impact the industry positively.

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