The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 15, 2005
Filed:
Aug. 13, 2002
In-kyun Shin, Suwon, KR;
Jung-min Sohn, Yongin, KR;
Hee-sun Yoon, Yongin, KR;
Seong-woon Choi, Suwon, KR;
In-Kyun Shin, Suwon, KR;
Jung-min Sohn, Yongin, KR;
Hee-sun Yoon, Yongin, KR;
Seong-woon Choi, Suwon, KR;
Samsung Electronics Co., Ltd., Suwon, KR;
Abstract
A photomask that is capable of implementing off-axis illumination (OAI), and a method of fabricating the same, are provided. The photomask includes a transparent substrate, a plurality of opaque patterns formed on the front surface of the transparent substrate, for defining a floodlighting portion for forming patterns, and a plurality of phase gratings formed on the back surface of the transparent substrate, allowing off-axis illumination (OAI) of an incident light source beyond the OAI limit of exposure equipment, allowing use in the outmost region of an aperture, and allowing modified illumination having a shape suitable for the layout of the opaque patterns.