Jung-Min Sohn

Title: Jung-Min Sohn: Innovator in Photolithography Technology

Introduction

Jung-Min Sohn is a prominent inventor based in Yongin, South Korea. He has made significant contributions to the field of photolithography, particularly in the development of advanced masks and methods for measuring and correcting flare in photolithographic systems. With a total of 3 patents, his work has had a substantial impact on the semiconductor manufacturing industry.

Latest Patents

Jung-Min Sohn's latest patents include innovative technologies such as a mask for use in measuring flare, a method of manufacturing the mask, a method of identifying flare-affected regions on wafers, and a method of designing new masks to correct for flare. These inventions provide a comprehensive approach to quantifying flare produced by projection lenses in photolithography systems. By comparing photoresist patterns formed through different regions of a mask, his methods allow for the identification of flare-affected areas on wafers. This enables the formation of uniform photoresist patterns by calculating the effective amount of flare based on the open ratio of affected regions. Additionally, he has developed a photomask capable of implementing off-axis illumination (OAI), which enhances the capabilities of exposure equipment.

Career Highlights

Jung-Min Sohn is currently employed at Samsung Electronics Co., Ltd., where he continues to push the boundaries of innovation in photolithography. His work is essential in improving the precision and efficiency of semiconductor manufacturing processes.

Collaborations

Some of his notable coworkers include Seong-Woon Choi and Won-Tai Ki, who have collaborated with him on various projects within the field.

Conclusion

Jung-Min Sohn's contributions to photolithography technology exemplify the importance of innovation in the semiconductor industry. His patents not only address current challenges but also pave the way for future advancements in manufacturing processes.