Seok-Ryeul Lee

Title: Seok-Ryeul Lee and Reticle Monitoring in Photolithography.

Introduction

Seok-Ryeul Lee is an inventor associated with Hwaseong, South Korea, and Samsung Electronics Co., Ltd. His patent work addresses reticle management during semiconductor photolithography, with a focus on reducing contamination-related process failures.

Latest Patents

The available information identifies one patent associated with Lee: “Photolithography System and Method of Monitoring the Same.” The invention describes a system that calculates the accumulated dosage of illuminating light applied to a reticle during an exposure process. A comparator checks that dosage against a preset reference, and a controller suspends photolithography when the accumulated dosage reaches or exceeds the threshold. This monitoring approach is intended to minimize haze contamination on the reticle and help prevent process failures. Lee is credited with 1 patent in the information provided.

Career Highlights

Lee’s documented patent contribution concerns monitoring reticle exposure in semiconductor manufacturing. The system connects dosage calculation and threshold-based control to the exposing apparatus, providing a way to manage reticle use during production.

Collaborations

The supplied information names Jung-sung Hwang and Tae-Jin Hwang as Lee’s coworkers. It does not specify their roles in the patent or describe particular collaborative contributions.

Conclusion

Seok-Ryeul Lee’s identified patent presents a practical monitoring method for managing reticle exposure, limiting haze contamination, and supporting reliable photolithography at Samsung Electronics Co., Ltd.