The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 09, 2007
Filed:
Dec. 22, 2004
Yo-han Ahn, Yongin-si, KR;
Seok-ryeul Lee, Hwasung-si, KR;
Jung-sung Hwang, Suwon-si, KR;
Tae-jin Hwang, Yongin-si, KR;
Byung-moo Lee, Hwasung-si, KR;
Yo-Han Ahn, Yongin-si, KR;
Seok-Ryeul Lee, Hwasung-si, KR;
Jung-Sung Hwang, Suwon-si, KR;
Tae-Jin Hwang, Yongin-si, KR;
Byung-Moo Lee, Hwasung-si, KR;
Samsung Electronics Co., Ltd., Suwon-si, KR;
Abstract
A management system and method of a reticle in an exposing process are disclosed. A calculator calculates an accumulated dosage of an illuminating light irradiated onto a reticle used in a photolithography process. The calculator is connected to an exposing apparatus to expose photoresist on a semiconductor substrate. A comparator compares the calculated accumulated dosage with a preset reference dosage. When the calculated accumulated dosage is greater than or equal to the reference dosage, a controller suspends the photolithography process. Minimizing haze contamination on the reticle, thus preventing process failures.