Bucheon, South Korea

Seok-mo Chang

This inventor holds 2 USPTO granted patents. Top assignee: Samsung Electro-Mechanics Co., Ltd.. Active years: 2010-2011.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Seok-mo Chang. Retrieved from https://idiyas.com/inventor/seok-mo-chang-ti0wjbei

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

Average Co-Inventor Count = 5.0

ph-index = 2

Forward Citations = 6(Granted Patents)


Company Filing History:


Years Active: 2010-2011

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2 patents (USPTO):Explore Patents

Title: Seok-mo Chang: Innovator in Microelectromechanical Systems

Introduction

Seok-mo Chang is a prominent inventor based in Bucheon, South Korea. He has made significant contributions to the field of microelectromechanical systems (MEMS). With a total of 2 patents, his work has garnered attention in the technology sector.

Latest Patents

Chang's latest patents focus on a MEMS device and its fabrication method. The MEMS device includes a frame, an actuator formed on the same layer as the frame, and at least one stopper that restricts the actuator's displacement in a vertical direction. The fabrication process involves bonding a second substrate to a first substrate, forming the frame and actuator by partially removing the first substrate, and creating the stopper by partially removing the second substrate. This innovative approach enhances the functionality and reliability of MEMS devices.

Career Highlights

Seok-mo Chang is currently employed at Samsung Electro-Mechanics Co., Ltd. His role at this leading company allows him to work on cutting-edge technologies and contribute to advancements in MEMS.

Collaborations

Chang collaborates with talented coworkers, including Jin-woo Cho and Yong-hwa Park. Their combined expertise fosters a creative environment that drives innovation in their projects.

Conclusion

Seok-mo Chang is a key figure in the development of MEMS technology, with a focus on innovative designs and fabrication methods. His contributions continue to shape the future of microelectromechanical systems.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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