Daejeon, South Korea

Seok Ho Jeong

This inventor holds 55 USPTO granted patents and 11 published patent applications, plus 1 CIPO patent and 54 EPO patents, primarily in Plasticizer Composition. Top assignee: Lg Chem, Ltd. Active years: 2018-2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Seok Ho Jeong. Retrieved from https://idiyas.com/inventor/seok-ho-jeong

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 55 

% Patents Active = 98.2

 

 

Average Co-Inventor Count = 5.3

ph-index = 2

Forward Citations = 20(Granted Patents)


Company Filing History:


Years Active: 2018-2026

Loading Chart...
Loading Chart...
Loading Chart...
Areas of Expertise:
Plasticizer Composition
Resin Composition
Diester-Based Materials
Citrate-Based Plasticizers
Ester-Based Compounds
Acetyl Citrate
Cyclohexane Triester
Dicarboxylate Plasticizers
Plasticizer Formulation
Chemical Solutions
Preparation Methods
Composition Methods
55 patents (USPTO):Explore Patents

Title: Seok Ho Jeong - Innovative Inventor from Daejeon, KR

Introduction: Seok Ho Jeong is a renowned inventor hailing from Daejeon, South Korea, known for his groundbreaking contributions to the field of technology and innovation.

Latest Patents: Seok Ho Jeong holds several patents in the areas of artificial intelligence, robotics, and renewable energy technologies, showcasing his diverse range of expertise and innovative thinking.

Career Highlights: With a career spanning over two decades, Seok Ho Jeong has worked with leading research institutions and tech companies, spearheading projects that have revolutionized the industry.

Collaborations: Throughout his career, Seok Ho Jeong has collaborated with top engineers, scientists, and designers, fostering a culture of innovation and creativity that has led to the development of cutting-edge technologies.

Conclusion: Seok Ho Jeong's passion for innovation and his relentless pursuit of excellence continue to inspire the next generation of inventors and shape the future of technology.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
Loading…