The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 23, 2025

Filed:

Mar. 31, 2021
Applicant:

Lg Chem, Ltd., Seoul, KR;

Inventors:

Hyun Kyu Kim, Daejeon, KR;

Jeong Ju Moon, Daejeon, KR;

Seok Ho Jeong, Daejeon, KR;

Woo Hyuk Choi, Daejeon, KR;

Assignee:

LG CHEM, LTD., Seoul, KR;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C08K 5/103 (2006.01); C08K 5/00 (2006.01);
U.S. Cl.
CPC ...
C08K 5/103 (2013.01); C08K 5/0016 (2013.01);
Abstract

The present invention relates to a tetraester-based plasticizer composition characterized in including a product derived from esterification reaction of an isomer mixture of hexanoic acid and a tetraol, wherein the degree of branching of the isomer mixture of hexanoic acid is 2.0 or less. If the plasticizer composition is applied to a resin, plasticization efficiency and absorption rate may be maintained to equal or better levels when compared to a case applying the conventional plasticizer, and mechanical properties, migration resistance, stress migration and loss properties may be markedly improved.


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