Seongnam, South Korea

Seok Hee Shim

This inventor holds 3 USPTO granted patents. Top assignee: Adp Engineering Co., Ltd.. Active years: 2012-2013.


Average Co-Inventor Count = 1.5

ph-index = 1

Forward Citations = 1(Granted Patents)


Company Filing History:


Years Active: 2012-2013

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3 patents (USPTO):Explore Patents

Title: Seok Hee Shim: Innovator in Substrate Attachment Technology

Introduction

Seok Hee Shim is a notable inventor based in Seongnam-si, South Korea. He has made significant contributions to the field of substrate attachment technology, holding three patents to his name. His innovative work focuses on improving the efficiency and precision of substrate alignment in various applications.

Latest Patents

One of Seok Hee Shim's latest patents is an "Apparatus for attaching substrates and gap control unit thereof." This apparatus includes a first chamber for supporting a first substrate and a second chamber for supporting a second substrate. A main seal member is strategically placed between the two chambers to maintain a seal and a controlled gap. Additionally, an alignment control part is integrated to ensure that the second chamber can move relative to the first chamber, allowing for precise alignment of the substrates. This design also enables the control of the gap between the chambers, ensuring a uniform distance between the substrates.

Career Highlights

Seok Hee Shim is currently employed at Adp Engineering Co., Ltd., where he continues to develop innovative solutions in substrate technology. His work has garnered attention for its practical applications in various industries, enhancing the performance and reliability of substrate attachment processes.

Collaborations

Seok Hee Shim collaborates with Bong Hwan Choi, a talented woman in the field, contributing to the advancement of their projects and innovations.

Conclusion

Seok Hee Shim's contributions to substrate attachment technology exemplify his commitment to innovation and excellence. His patents reflect a deep understanding of the technical challenges in the field, and his work continues to influence the industry positively.

Profile summary based on public USPTO records.
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