Tokyo, Japan

Seng Pei Liew

This inventor holds 3 USPTO granted patents and 1 published patent application. Top assignee: Nec Corporation. Active years: 2024-2025.

USPTO Granted Patents = 3 

% Patents Active = 100.0

Average Co-Inventor Count = 1.7

ph-index = 1


Company Filing History:


Years Active: 2024-2025

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3 patents (USPTO):Explore Patents

Title: The Innovative Contributions of Seng Pei Liew

Introduction

Seng Pei Liew is a notable inventor based in Tokyo, Japan. He has made significant contributions to the field of information processing, holding a total of 3 patents. His work focuses on the acquisition and processing of biometric information, showcasing his expertise in advanced technology.

Latest Patents

Seng Pei Liew's latest patents include an information processing device and method, as well as a recording medium. One of his key inventions involves an information processing system that acquires biometric information from multiple individuals. This system generates an adversarial example using the biometric data collected. Another important patent features a similarity degree calculator and an authorization system. This invention calculates a similarity degree between two sets of data based on multiple features, ensuring that the values obtained from the same data are distinct when processed through various feature functions.

Career Highlights

Seng Pei Liew is currently employed at NEC Corporation, a leading technology company known for its innovative solutions. His work at NEC has allowed him to develop cutting-edge technologies that enhance information processing capabilities.

Collaborations

Throughout his career, Seng Pei Liew has collaborated with talented individuals such as Takuma Amada and Kosuke Akimoto. These partnerships have contributed to the advancement of his projects and the successful development of his patents.

Conclusion

Seng Pei Liew's contributions to the field of information processing are noteworthy, with his innovative patents paving the way for advancements in biometric technology. His work continues to influence the industry and inspire future innovations.

Profile summary based on public USPTO records.
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