Aichi, Japan

Seiya Ozawa

This inventor holds 1 USPTO granted patent. Top assignee: C.uyemura Co., Ltd.. Active years: 2022.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Seiya Ozawa. Retrieved from https://idiyas.com/inventor/seiya-ozawa

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 5.0

ph-index = 1


Company Filing History:


Years Active: 2022

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1 patent (USPTO):Explore Patents

Title: Seiya Ozawa: Innovator in Shaft Member Technology

Introduction

Seiya Ozawa is a notable inventor based in Aichi, Japan. He has made significant contributions to the field of engineering, particularly in the development of shaft members. His innovative approach has led to advancements that enhance the strength and efficiency of these components.

Latest Patents

Ozawa holds a patent for a "Shaft member and manufacturing method of shaft member." This invention includes a base material made of steel with a shaft shape, a low phosphorus plating layer, and a base plating layer. The unique composition allows for increased strength while reducing the overall size of the shaft member. This innovation is crucial for various applications in engineering and manufacturing.

Career Highlights

Throughout his career, Seiya Ozawa has worked with C. Uyemura Co., Ltd., where he has been able to apply his expertise in developing advanced materials and manufacturing techniques. His work has been instrumental in pushing the boundaries of what is possible in shaft member technology.

Collaborations

Ozawa collaborates with talented individuals such as Akihiko Kita and Takahiro Mori. Their combined efforts contribute to the innovative environment at C. Uyemura Co., Ltd., fostering creativity and technological advancement.

Conclusion

Seiya Ozawa's contributions to shaft member technology exemplify the impact of innovation in engineering. His patent and collaborative efforts continue to influence the industry positively.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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