Sayama, Japan

Seiya Onodera


Average Co-Inventor Count = 5.0

ph-index = 2

Forward Citations = 15(Granted Patents)


Company Filing History:


Years Active: 2005-2007

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2 patents (USPTO):Explore Patents

Title: Seiya Onodera: Innovator in Photocurable Resin Technology

Introduction

Seiya Onodera is a notable inventor based in Sayama, Japan. He has made significant contributions to the field of photocurable and thermosetting resin compositions. With a total of two patents to his name, Onodera's work has implications for various applications, particularly in the electronics industry.

Latest Patents

Onodera's latest patents focus on a photocurable and thermosetting resin composition. This composition includes a photosensitive prepolymer with a carboxyl group and at least two ethylenically unsaturated double bonds. Additionally, it contains a polymerization initiator, a diluent, an oxetane compound with at least two oxetanyl groups, and a curing promoter. This innovative formulation is developable with an alkaline solution and can be prepared as a one-package solution. The resulting materials are particularly useful as solder resists for printed circuit boards and interlaminar insulating materials for multi-layer printed circuit boards.

Career Highlights

Throughout his career, Seiya Onodera has worked with esteemed institutions such as Kanagawa University and Taiyo Ink Manufacturing Co., Ltd. His experience in these organizations has allowed him to refine his expertise in resin technology and contribute to advancements in the field.

Collaborations

Onodera has collaborated with notable colleagues, including Tadatomi Nishikubo and Atsushi Kameyama. These partnerships have facilitated the development of innovative solutions in resin compositions.

Conclusion

Seiya Onodera's contributions to photocurable and thermosetting resin technology highlight his role as an influential inventor. His patents reflect a commitment to advancing materials used in electronics, showcasing the importance of innovation in this field.

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