Hitachi, Japan

Seishiro Sato

This inventor holds 3 USPTO granted patents. Top assignee: Hitachi, Ltd.. Active years: 1977-1994.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Seishiro Sato. Retrieved from https://idiyas.com/inventor/seishiro-sato-ut1mho87

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 4.5

ph-index = 3

Forward Citations = 51(Granted Patents)


Location History:

  • Hitachi, JA (1977)
  • Hitachi, JP (1994)

Company Filing History:


Years Active: 1977-1994

Loading Chart...
3 patents (USPTO):Explore Patents

Title: Seishiro Sato: Innovator in Semiconductor Processing

Introduction

Seishiro Sato is a prominent inventor based in Hitachi, Japan. He has made significant contributions to the field of semiconductor processing, holding a total of 3 patents. His work has been instrumental in advancing technologies that are crucial for modern electronics.

Latest Patents

Among his latest patents are a processing machine for electron beam lithography systems and a controller for semiconductor processing machines. These innovations reflect his expertise and commitment to enhancing the efficiency and effectiveness of semiconductor manufacturing processes.

Career Highlights

Seishiro Sato is associated with Hitachi, Ltd., a leading company in technology and innovation. His role at Hitachi has allowed him to work on cutting-edge projects that push the boundaries of semiconductor technology.

Collaborations

Throughout his career, Sato has collaborated with notable colleagues, including Kazunori Hasimoto and Tomoyuki Miyata. These partnerships have fostered a collaborative environment that encourages innovation and the sharing of ideas.

Conclusion

Seishiro Sato's contributions to semiconductor processing through his patents and collaborations highlight his importance in the field. His work continues to influence the technology landscape, making him a key figure in the industry.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
Loading…